JPH01165626U - - Google Patents
Info
- Publication number
- JPH01165626U JPH01165626U JP6248988U JP6248988U JPH01165626U JP H01165626 U JPH01165626 U JP H01165626U JP 6248988 U JP6248988 U JP 6248988U JP 6248988 U JP6248988 U JP 6248988U JP H01165626 U JPH01165626 U JP H01165626U
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- plasma
- ashing device
- wafer
- plasma ashing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004380 ashing Methods 0.000 claims 2
- 230000005684 electric field Effects 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6248988U JPH01165626U (en]) | 1988-05-12 | 1988-05-12 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6248988U JPH01165626U (en]) | 1988-05-12 | 1988-05-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01165626U true JPH01165626U (en]) | 1989-11-20 |
Family
ID=31288097
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6248988U Pending JPH01165626U (en]) | 1988-05-12 | 1988-05-12 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01165626U (en]) |
-
1988
- 1988-05-12 JP JP6248988U patent/JPH01165626U/ja active Pending